The project leader presented the technology which has been protected by a patent application at this anual conference of Indian plasma scientists. The conference is well attended also by researchers from Industry. India is the largest market for such products worldwide.
F.09 Development of a new technological process or technology
COBISS.SI-ID: 28211239Since the innovative technology is particularly suitable for application in electro-industry we hurried with protection of the intellectrual rights. The target market is India which is currently the largest producer of components where our technology could improve the quality of the products. We have confirmed the hypothesis of excellent etching selectivity for composites using our plasma treatment.
F.32 International patent
COBISS.SI-ID: 28437543The patented solution for improving of glass-polymer insulation materials has been presented at this congress. The innovative technology may be interesting also for application in products different from commutators.
F.09 Development of a new technological process or technology
COBISS.SI-ID: 28941607The Slovenian patent office has granted the patent which has been filed in 2014. The PCT application has been submitted, too. The patent teaches method and device (sensor) for measuring H-atom density. The H-atoms are formed as a consequence of ammonia dissociation and we shall use it for control of plasma stability upon treatment of glass-polymer isolation.
F.06 Development of a new product
COBISS.SI-ID: 27732007The loss of plasma species due to heterogeneous surface recombination represents a key issue when treating solid materials with amonia plasma. To the best of our knowledge this is the first attempt worldwide to address this phenomenon for the case of H + N atoms. The results represent a solid base for understanding such phenomena. The project leader served as the student supervisor.
F.02 Acquisition of new scientific knowledge
COBISS.SI-ID: 2827108