Defect, that are presented in thin films made by PVD deposition systems, can decisively reduce their protective properties, especially corrosion protections. We explain the origin of the defects and base on this, established that the cleaning procedure is very important to reduce the defect density on minimum.
COBISS.SI-ID: 22830887
The thin films of Al (-Nb, Mo, Ta) were prepared by magnetron codeposition at room temperature. The average film thickness was from 325 to 400 nm, depending on the film composition. For all the Al–(Nb, Mo, Ta) alloy compositions, the microhardness is predominantly under the influence of the harder element, and monotonically decreases with the increase of the aluminum content. However, the microhardness of the amorphous AlTa films was higher than the bulk value of a harder element (Ta) in the alloy.
COBISS.SI-ID: 22687527