We designed a universal approach toward inkjet printing of metal oxides on arbitrary solid substrates. The full control over the wetting properties was achieved by introducing a few nanometre thick polymeric layer with textured topography. This in combination with the specially designed ink formulation enabled a highly efficient deposition of flat structures with good lateral definition. The developed process is highly efficient and enables conformal stacking of functional oxide layers according to the user-defined geometry, sequence arrangement, and layer thickness ? its large potential was demonstrated by manufacturing of all-printed ferroelectric capacitors composed of as much as 16 individual layers. A detailed structural and electrical characterization revealed excellent functional properties of printed devices.
COBISS.SI-ID: 32849447
The surface properties of a substrate are among the most important parameters in the printing technology of functional materials, determining both the resolution and stability of the printed features. We have developed a method for preparation of thin polymeric layers with large contact angle hysteresis, which are used for adjustments of wetting of arbitrary solid optical-grade substrates. The method is based on coating the surface with a mixture of polymers that undergo a phase separation and form an inhomogeneous, nano-textured surface upon deposition. The wetting is in second step regulated by surface treatment of the polymeric layer (O2 plasma, UV/O3). Our surface adjustment layer is suitable for various printing applications (inkjet-, gravure-, spray- or screen-printing) or any other application which require precisely regulated wetting and large contact angle hysteresis.
COBISS.SI-ID: 32699175
We have developed a novel process for patterning of lead zirconate titanate (PZT) films on pristine platinized silicon through the use of inkjet-printed alkanethiolate-based templates. The technique requires neither lithography nor etching, respectively, before and after PZT printing. The developed process allows feature sizes in the sub-100 µm range with control over the thickness of the final film, which displays ferroelectric and piezoelectric properties comparabale to those of solution-derived thin films.
COBISS.SI-ID: 31843623