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Projects / Programmes
Ionsko in kemijsko črpanje v UV vakuumu (Slovene)
Research activity
| Code | Science | Field | Subfield |
|---|---|---|---|
| 2.09.05 | Engineering sciences and technologies | Electronic components and technologies | Vacuum technologies |
| Code | Science | Field |
|---|---|---|
| T001 | Technological sciences | Electronics and Electrical technology |
| T210 | Technological sciences | Mechanical engineering, hydraulics, vacuum technology, vibration and acoustic engineering |
Keywords
vacuum, pumping, ion pump, magnetron, thin films, titanium compounds, hydrogen, sputtering
Evaluation
(metodology)
Citations
Citations for bibliographic records in COBIB.SI that are linked to records in citation databases
Organisations (2) , Researchers (10)
1534 Institute of Surface Engineering and Optoelectronics
| no. | Code | Name and surname | Research area | Role | Period | No. of publicationsNo. of publications |
|---|---|---|---|---|---|---|
| 1. | 15703 | Electronic components and technologies | Researcher | 1998 - 2001 | 723 | |
| 2. | 10429 | Electronic components and technologies | Researcher | 1999 - 2001 | 1,405 | |
| 3. | 03066 | Electronic components and technologies | Researcher | 1998 - 2001 | 250 | |
| 4. | 09105 | Electronic components and technologies | Researcher | 1999 - 2001 | 113 | |
| 5. | 17622 | Researcher | 1998 - 2001 | 18 | ||
| 6. | 01741 | Electronic components and technologies | Head | 1999 - 2001 | 383 | |
| 7. | 03366 | Electronic components and technologies | Researcher | 1999 - 2001 | 113 |
0204 Institute for electronic and vacuum tehnique
| no. | Code | Name and surname | Research area | Role | Period | No. of publicationsNo. of publications |
|---|---|---|---|---|---|---|
| 1. | 07480 | Electronic components and technologies | Researcher | 1999 - 2001 | 67 | |
| 2. | 15884 | Electronic components and technologies | Researcher | 2000 - 2001 | 13 | |
| 3. | 01737 | Electronic components and technologies | Researcher | 2000 - 2001 | 249 |
Abstract
Characteristics of low pressure discharges in perpendicular electric and magnetic field with various electrode configuration will be studied. The generation of positive ions in the discharge and their interaction with the cathode surface will be analyzed. The sputtering coefficient as a function of the electrode configuration and the electric and magnetic field strength will be determined. Sorption of molecules and atoms of active gases on the anode and cathode surface will be studied. Samples of thin films of titanium compounds will be prepared and a study of hydrogen pumping by the samples will be performed. Optimal construction of multi-cell magnetron inserts for ion pumps according to the pumping speed, base pressure, life time and production costs will be determined.