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Equipment
Thin film deposition system
Purpose of equipment
The PVD deposition system from Prevac allows the growth of thin films of magnetic materials (either alloys or layers of Fe, Ni, or co-doped with transition metals, for example), oxides (like alumina and indium tin oxide), and dielectrics for applications in devices. For better stochiometry control, better crystallinity, and film homogeneity, it is possible to use reactive sputtering with nitrogen or oxygen gas, heat the sample, apply a bias to the substrate, or use an ion source, which will help in both cleaning and improving the quality.
Access of equipment
Responsible for equipment:
PhD Barbara Ressel
For access to the equipment, contact Barbara Ressel (barbara.ressel@ung.si) with a description of the planned experiment. Sputter targets are provided by the user. After the experiment is approved, access is usually arranged within one month.
For access to the equipment, contact Barbara Ressel (barbara.ressel@ung.si) with a description of the planned experiment. Sputter targets are provided by the user. After the experiment is approved, access is usually arranged within one month.
ARIS research and infrastructure programmes (1) Legend
| no. | Code | Title | Period | Head | No. of publicationsNo. of publications |
|---|---|---|---|---|---|
| 1. | I0-0033 | 1/1/2022 - 12/31/2027 | 1,547 |
Organisations (1)
| no. | Code | Research organisation | City | Registration number | No. of publicationsNo. of publications |
|---|---|---|---|---|---|
| 1. | 1540 | Nova Gorica | 5920884000 | 14,575 |