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Equipment
High-resolution system with a reaction chamber intended for chemical vapor deposition of silane-based thin layers with the help of plasma and a reaction chamber intended for reactive ion etching techniques in high-density plasma
Purpose of equipment
Application, removal and microprocessing of thin films for the needs of the semiconductor and photonics industry.
Access of equipment
Responsible for equipment:
PhD Marko Topič
To access and use the equipment the interested person should contact the responsible person: Miha Cacovich (miha.cacovich@fe.uni-lj.si)
To access and use the equipment the interested person should contact the responsible person: Miha Cacovich (miha.cacovich@fe.uni-lj.si)
ARIS research and infrastructure programmes (1) Legend
| no. | Code | Title | Period | Head | No. of publicationsNo. of publications |
|---|---|---|---|---|---|
| 1. | P2-0415 | 1/1/2022 - 12/31/2027 | 3,677 |
Organisations (1)
| no. | Code | Research organisation | City | Registration number | No. of publicationsNo. of publications |
|---|---|---|---|---|---|
| 1. | 1538 | Ljubljana | 1626965 | 29,104 |