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Equipment
Dedicated wet station for chemical processing of substrates
Purpose of equipment
The equipment is used for chemical cleaning and rinsing of samples in the manufacturing processes of semiconductor elements, which require the use of clean surfaces, such as, for e.g., before the implementation of high-temperature, plasma and other technological processes. The device contains a rinser for quick removal of impurities (QDR) and a control unit with a water resistance meter, which enables automatic and controlled cleaning of samples. The rinser allows simultaneous cleaning of 25 100 mm silicon wafers in standard wafer carrier.
Access of equipment
Responsible for equipment:
PhD Danilo Vrtačnik
The equipment is installed in clean room environment and is accessible also to other research institutions.
The equipment is installed in clean room environment and is accessible also to other research institutions.
Organisations (1)
| no. | Code | Research organisation | City | Registration number | No. of publicationsNo. of publications |
|---|---|---|---|---|---|
| 1. | 1538 | Ljubljana | 1626965 | 29,104 |