Equipment source: ARIS

mask aligner

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Purpose of equipment
Mask aligner MA BA6 Gen 4 is a system designed for research institutions, universities and sample production. The main emphasis is on flexibility both in procedures with wavelengths 365nm and 405 nm in 4 different modes of mapping, from proximity to vacuum.
Access of equipment
Responsible for equipment: PhD Janez Trontelj
URL: http://lmfe.fe.uni-lj.si/o-nas/oprema/
Mask aligner is located in Laboratory for Microelectronics. To use the set-up the head of LMFE prof. dr. Janez Trontelj should be contacted.
Research projects (2) Legend
no. Code Title Period Head No. of publications
1.  L2-9236  Terahertz waves based metrology in extreme environments  7/1/2018 - 6/30/2021  PhD Janez Trontelj  1,675 
2.  J7-8272  Integrated multi-channel artificial nose for vapor trace detection  5/1/2017 - 4/30/2020  PhD Igor Muševič  2,871 
ARIS research and infrastructure programmes (1) Legend
no. Code Title Period Head No. of publications
1.  P2-0257  Systems on chip with integrated micromechanical THz, optical, magnetic and electrochemical sensors  1/1/2014 - 12/31/2019  PhD Janez Trontelj  1,855 
Organisations (1)
no. Code Research organisation City Registration number No. of publications
1.  1538  University of Ljubljana, Faculty of Electrical Engineering  Ljubljana  1626965  29,104 
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